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Titanium Nitride (TiN)

Titanium nitride (TiN) is an extremely hard ceramic material it is used in semiconductor devices as a barrier material. Because of its Refractive Index (RI) it has application in optical coatings for mirrors and filters.
TiN may be deposited using Atomic Layer Deposition (ALD) or Ion Beam Deposition (IBD) and etched using Inductively Coupled Plasma (ICP).

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High material quality, even at low deposition temperature.

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