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Silicon (Si)

Oxford Instruments Plasma Technology provides world-leading process solutions for working with Silicon (Si). From fast, deep, controlled etch to the finest nanostructures we have the plasma solution you need.

Si is the cornerstone of the semiconductor industry as well as providing the raw material for the majority of MEMS devices. Its properties and abundance has meant that it is ever present in modern technology.

Several solutions are available for etching Si and the choice depends very much on which device structure is required:

  • Bosch process enables high etch rates, selectivity and anisotropy
  • Cryogenic Deep Silicon Etch (Cryo-DSiE) is typically used for smooth sidewalls and/or nano-etching or tapered profiles in applications such as micro moulds etc.
  • Mixed processes are an option for shallow, low aspect fine features
  • Deposition of high-quality a-Si is achieved using PECVD
Silicon
  • High rate, high selectivity deep silicon etch process using alternating deposition and etch steps
  • Applicable to silicon, silicon-on-insulator (SOI) and silicon on glass
  • Wafer size: up to 2" 
  • Wafer size: up to 200mm   
Bosch deep Si etching
Bosch DSi Etching Oxford Logo Bosch DSi Etching

Deep Silicon Bosch etch

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Poly Si can use different chemistries using pure and diluted silane. High quality Poly Si over 2inch wafers.

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Si Mixed Etching

Si may be dry etched using HBr based selective silicon etching with the Inductively Coupled Plasma (ICP) process technique. 

Large process database on various process chemistries.
Competitive process results in a large number of applications from black Si formation to high aspect ratio features.

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HBr Si Etching
  • Isotropic Si etch with high selectivity to Photoresist (PR) and Silicon Oxide (SiO2)
  • Also applicable as a MEMS release etch
  • Wafer size: up to 200mm
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Isotropic Si Etching
  • Deep Si etching using a simple and extremely clean plasma chemistry at cryogenic temperatures
  • Vertical features with smooth sidewalls
  • Wafer size: up to 200mm
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Cryogenic Si etch

Cryogenic Si etch

Cryogenic Si etch

Cryogenic Si etch

Ultra high selectivity cryo-silicon etch

Ultra high selectivity cryo-silicon etch


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