Platinum (Pt) is a highly conductive noble metal that is commonly used in electrical contacts to semiconductor devices. It can be used in many applications due to its catalytic properties and its stability in oxidizing environments.
Platinum can be etched for the manufacturing of a wide range of advanced devices using Inductively Coupled Plasma (ICP), Ion Beam Etching and Reactive Ion Etching (RIE). Furthermore, it may be deposited using Atomic Layer Deposition (ALD) and Ion Beam Deposition (IBD).
Excellent material quality, not only for the 200-300 °C deposition temperature range also used for thermal ALD, but by using oxygen and hydrogen plasmas also possible at low deposition temperature. These can even be down to room temperature for temperature sensitive applications such as deposition on polymer or resists.More on ALD Request more information