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Nickel 

Nickel (Ni) is highly corrosion resistant and is used for electrical contacts. It may be deposited using Ion Beam Deposition (IBD) and it can be etched using Inductively Coupled Plasma (ICP), Reactive Ion Etching (RIE) or Ion Beam Etch (IBE).

Competitive etching rate with good control of redeposition.

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Competitive etching rate with good control of redeposition.

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Process expertise applied to control redeposition and produce good profile at competitive etching rate. 

  • Wafer size: up to 200mm
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Competitive process results.

  • Wafer size: up to 200mm
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