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Amorphous Silicon Deposition

Amorphous Silicon (a-Si) as a semiconductor is the most widespread material used for photovoltaic technologies ie. solar cells. It is also used for thin film transistors in liquid crystal displays (LCDs). a-Si can be deposited using Plasma Enhanced Chemical Vapour Deposition (PECVD) and Inductively Coupled Plasma CVD (ICP-CVD)

Uniform film deposited with low stress. Doping possible with PH3 and B2H6

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Uniform film deposited with low stress. Doping possible with PH3 and B2H6

  • Single wafer size: up to 200mm
  • Batch size: up to 9x2", 4x3"
  • Single wafer size: up to 300mm
  • Batch size: up to 43x2", 19x3", 10x100mm, 7x120mm, 4x150mm, 2x200mm
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