Oxford In Your University is an exclusive virtual seminar for Stanford University to learn about the latest process developments for Quantum Technology and Atomic Scale Processing.
Hosted by our in-house experts, you'll get the latest insights on low damage plasma solutions and innovations.
This will be a truly interactive experience allowing you to stop the presentations and ask questions whenever you like. The session is confidential with all discussions kept within your company.
Don't miss out! Save your seat today.REGISTER NOW
Gain an insight into the basics of atomic layer deposition, atomic layer etching and how to grow 2D materials in a scalable way. See how the control of plasma and reactor conditions allows improved and tailored material properties. Combining and clustering these techniques allows for the full benefit of atomic-scale processing. We’ll also show examples of this for a wide range of oxides, nitrides and sulphides.
Dr Harm Knoops is the Atomic Scale Segment Specialist at Oxford Instruments Plasma Technology and holds a part-time assistant professorship position at the Eindhoven University of Technology. His current work covers the fields of (plasma-based) synthesis of thin films, advanced diagnostics and understanding and developing plasma ALD.
His main goals are to improve and advance atomic scale processes and applications for Oxford Instruments and its customers. His recent involvement in applying RF substrate biasing during plasma ALD and the growth of 2D-MoS2 by plasma ALD have been well-received by the field.