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Process News Autumn 2016

Welcome to this edition of Process News.

Oxford Instruments Plasma Technology provides leading edge tools and processes to key markets worldwide.

In this issue, we explore topics such as:

  • Recent advances in SiC via etch
    process for RF device manufacture
  • High quality MoS2 CVD
    growth process developed
  • In-situ plasma pre-treatments on
    GaN surfaces for reduction of
    interface traps in metal-oxidesemiconductor
    capacitors & high
    electron mobility transistors using
    ALD Al2O3
  • Precision 3-D nanomachining
    of silicon nanowires
  • One dimensional contacts to a 2D
    material

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Read our latest Process News Newsletter here!