Oxford Instruments Plasma Technology is a leading supplier of innovative plasma processing solutions for Nickel, unlocking the maximum performance from your devices.
Nickel (Ni) is highly corrosion resistant and is used for electrical contacts in semiconductor devices. It can also be used as a hard mask for plasma etching. It may be deposited using Ion Beam Deposition (IBD) and it can be etched using Inductively Coupled Plasma (ICP), Reactive Ion Etching (RIE) or Ion Beam Etch (IBE). It etches cleanly and anisotropically with Oxford Instrument's optimised plasma solutions.